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CRANN - Advanced Microscopy Laboratory
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CRANN - Advanced Microscopy Laboratory
Language
Gaeilge
(Baile)
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Instrumentation
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Electron Beam Lithography
Electron Beam Lithography
Zeiss SUPRA 40
The Supra FESEM is primarily used for high resolution electron beam lithography and imaging purposes.
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Elionix ELS 7700
The Elionix ELS 7700 is a dedicated 75 kV electron beam lithography system. Equipped with a laser interferometer controlled stage.
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Instrumentation
Transmission Electron Microscopes (STEM/TEM)
The Nion UltraSTEM
JEOL 2100 LaB TEM
FEI Titan 80 – 300kV FEG S/TEM
Scanning Electron Microscopes
Zeiss ULTRA plus Cryo SEM
Zeiss ULTRA plus
Electron Beam Lithography
Zeiss SUPRA 40
Elionix ELS 7700
Focused Ion Beam (FIB) Technologies
Zeiss AURIGA Focused Ion Beam
Zeiss ORION Nanofab
FEI Strata 235DB
Sample Preparation
Fishione 1040 NanoMill
